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AGC's optical components provide high transmission, laser durability, good homogeneity, and low compression at UV to VUV wavelengths. Strict process control standards and proprietary technologies ensure the highest quality material standards required by large-size optical systems.

The synthetic quartz in AGC's AQ series is ideal for optical lens materials for all wavelengths from i-line to F2 lasers.

 

Product Features

Characteristics

  • High transmittance for deep ultraviolet rays with frequencies < 200 nm ranging
    from the i-ray to KrF, ArF, or Xe excimer lamps, and even for near infrared rays*1
  • Excellent Compaction/Rarefaction and Polarization Induced Birefringence (PIB) characteristics*2
  • Resistant to heat processing around 1,000°C*3
  • Excellent durability against high-energy laser beams
  • Thermal expansion as low as 1/10 times that of conventional glasses
  • High uniformity
  • Very high purity, very low metal impurity content
  • Low OH group content
  • Outstanding chemical resistance
  • Low Dielectric Loss

Typical Properties

      AQ
Chemical Constitution SiO2 wt (%) 100
Thermal Properties CTE
Softening Point
Annealing Point
Strain Point
ppm/K (50-200°C)
°C
°C
°C
0.6
1,600
1,120
1,060
Optical Properties Refracive Index nD 1.46
Chemical Properties Acid Resistance
Alkali Resistance
mg/cm2
mg/cm2
0.000
0.032
Mechanical Properties Density
Young's Modulus
Knoop Micro Hardness
g/cm3
GPa
kg/mm2
2.20
74
540
Electrical Properties Bulk Resistive
Dielectric Constant
log (Ω•cm) at 200°C
at 1MH,R.T.  
12.5
4.0  
typical data, not guaranteed

Grades

Grade Features Primary Applications
AQ Standard grade Photomask substrates, Glass wafers, Illumination optics
AQ3 High transmittance in wide wavelengths Xe excimer lamp (172nm)
QJ AQ enhanced uniformity of refractive index Projection options for i-line (365nm)
AQ2 High resistance against deep UV excimer laser, high uniform reactive index Projection optics for ArF excimer laser (193mm)
AQT Very high resistance against deep UV excimer laser beam Illumination optics for ArF excimer laser (193nm)
AQR AQ enhanced in purity, with metallic impurity content assured Glass wafer for High temperature & High purity processes
QC-i High transmittance for deep UV excimer laser & low biofringence Photomask substrate for ArF immersion system

Optical Wavelengths

Transmission Spectrum

 
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